真空
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
速報
高周波マグネトロンスパッタリング法によるPb(Zr, Ti)O3 圧電薄膜の量産技術
木村 勲西岡 浩菊地 真鄒 紅コウ
著者情報
ジャーナル フリー

2006 年 49 巻 3 号 p. 174-176

詳細
抄録
  In this study, SME-200 (ULVAC and Inc.) was the mass production system of a PZT deposition got over the problems, and it was there, and deposition temperature of PZT thin films were investigated as a parameter by this research. (100)/(001) and (111) oriented Pb(Zr, Ti)O3 Piezoelectric thin films were fabricated on (111)Pt/Ti/SiO2/Si substrate using a RF magnetron sputtering technique. Polarization and displacement in these films were simultaneously observed through an atomic force microscope (AFM) that was attached to a ferroelectric test system. As a result, 3-μm-thick PZT film with Pr value of 41 μm/cm2 at an applied voltage of 30 V were obtained for (100)/(001) oriented film.
著者関連情報
© 2006 日本真空協会
前の記事 次の記事
feedback
Top