真空
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
解説
表面分析のためのマイクロイオンビーム
小林 明
著者情報
ジャーナル フリー

2007 年 50 巻 9 号 p. 558-563

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抄録
  Rutherford Backscattering spectrometry (RBS) and Particle Induced X-ray Emission (PIXE) are well-known techniques of ion beam analysis using MeV energy ions and they are used for material analysis like semiconductors, environmental analysis. RBS/PIXE systems are often relatively large with high energy accelerators, and are not very convenient for practical purposes.
  We describe here a new compact RBS/PIXE system with a small accelerator with original ion optics and beam line, which can produce a microprobe with a spot size of about 1 um.
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© 2007 日本真空協会
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