New UHV evaporator with electron gun has been designed for a broad range of substrate temperature and deposition rate. While the pressure is ultimately 5×10-10 torr by using a nude B-A gage, it falls down to 5×10-8 torr during evaporation of Nb. The electron beam gun has a tele-focus type and a full power of 50 kV 20 mA, and is valid in evaporation of refractory materials.
Ferromagnetic Ni thin films are prepared in this UHV evaporator and examined by means of FMR. They have a smaller residual planar stress than those in a usual HV evaporator. Superconducting Nb thin films are also prepared and found to be abnormal in the transition temperature and critical field.
