Abstract
Superconducting thin films (Nb3Ge, Nb3Si and Nb) have been prepared in a chamber cooled with liquid N2 at high rate by a magnetron sputtering method.
Following results were obtained.
(a) The chamber wall acts as a cryo-pump, trapping impurity gas during sputtering so that bell jar was completely separated from a pumping system to obtain environment free from oil. Nb films of three nine were obtained.
(b) Just after a deposition, thermal quenching down to 80 K was performed by a thermal conduction of sample holder which contact with liquid N2 container. This method was tried for the first time. It was effective to depress an undersirous stable phase for preparing metastable Nb3Ge and Nb3Si. As a result, production of Nb3Ge become easy and Nb3Si was obtained with high TC nearly as high as by the explosion method.