Analysis of Relief-type Gratings in Amorphous As-Se-Ge Films

Abstract

A semiconductor As_10.0-Se_67.5-Ge_22.5 amorphous film is one of the photosensitive materials from which relief patterns can be obtained. Holographic characteristics of the amorphous film are different from that of a photoresist film. The differences have been proved by considering light absorption and side etching properties.
Moreover, we pointed out that “back-side” exposure could improve both diffraction efficiency and ratio of signal to noise.