アモルファスWO₃薄膜のイオンビームレジスト効果

抄録

Ion irradiation effect on amorphous WO₃ (a-WO₃) films was studied using thermionic Na⁺ ions with accelerating voltages V=412 kV. These films become insoluble in alkaline solution at values of ion dose beyond a threshold D_th. Exposure characteristics show that the contrast is considerably higher than that of conventional organic polymer electron-beam resists. The threshold dose, which was almost independent of the film thickness, increased gradually with increasing accelerating voltage of ions (D_th∝V^2/3). These results were compared with exposure characteristics for electron irradiation reported in the literature. A-WO₃ films are potentially useful as inorganic ion-beam resists.