Electrical Resistivity of Ag, Cu and Pd Films Prepared by Vapor-Quenching at 77 K

Abstract

An experimental study of the electrical resistivities of Ag, Cu and Pd films is given. These films have been prepared by vapor-quenching on cold substrates at 77 K.
The resistivities of Ag and Cu films exhibit no sharp decrease but show a gradual change with increasing temperature, which is the same characteristics with the results obtained by earlier workers.
This is the first measurement of the resistivity in Pd thin films made by low temperature condensation. The resistivity of Pd films decreases abruptly around 185 K with increasing temperature. This sudden, irreversible drop in the resistivity indicates a transformation from an amorphous to a crystalline state. The experimental result of the resistivity in Pd films is in agreement with earlier observation of the transformation based on an electron diffraction study by Fujime.