真空
Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
低気圧誘導結合型高周波放電プラズマの実験的研究
長濱 治男高元 嘩夫
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ジャーナル フリー

1989 年 32 巻 1 号 p. 20-25

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A inductively or capacitively coupled radio frequency discharge is being applied to the plasma CVD etc. The relations between r.f. power and electron density and temperatute, however, are not known in detail. A low pressure inductively coupled r.f. discharge generates two kinds of plasma states, that is, glow and arc plasma. The glow plasma generated at small r.f. power is weakly luminous, while the arc plasma at large r.f. power is intensly luminous. The authors have measured the radial distribution of electron density and temperature at two kinds of plasma states by the use of the double probes. It is found from the result that the electron density of the arc plasma is about 102 times higher than that of the glow plasma, on the contrary the electron temperatures of both plasmas are almost the same.
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