Fabrication Technology of Electrode for Liquid Crystal Display Panel

Abstract

Fine patterning technology of ITO and Ni on the Cr (Ni/Cr) bilayer film electrode for LCD panel was studied. Hl or HBr solution was found to be the most suitable etching solution for ITO because of small undercutting property.
For preferential etching for Ni/Cr double bilayer electrode on ITO, mixed solution of CH₃COOH-HNO₃-H₂SO₄ H₃PO₄ was found to be most suitable for Ni film, while for Cr film, Ce (NO₃) ₄·2NH₄NO₃ solution was found most suitable. For Ni etching, HNO₃ was the most effective component because it shifted the electrode potential to the nobler direction, resulting in an increased etching rate.