Abstract
We developed new methods for anodizing aluminum surfaces of plasma process chambers, one in sulfuric acid, and another in oxalic acid, in order to reduce particulate generation. The anodized films show a lower density of cracks than conventionally anodized films even after exposing to high temperature. Therefore, they have a better performance of small number in particulate. Analysis by X-ray diffraction, scanning electron microscopy, infrared spectroscopy and electron probe microanalysis reveals that both films are amorphous and that a cracking mechanism depends on the electrolyte and anodizing process. It is also found that number of cracks and total amount of outgassing increase after sealing process.
