Annealing Effect of Iron Disilicide (β-FeSi₂) Thin Films Irradiated by Nd : YAG Laser

Abstract

Iron disilicide (β-FeSi₂) thin films were deposited on Si (100) substrate by a pulsed laser deposition using SHG of a Nd : YAG laser. The film crystallizations were varied by annealing time of β-FeSi₂ films irradiated by Nd : YAG laser. From XRD spectra of these films, peaks of β-FeSi₂ (400) and (800) were identified. It was found from FE-SEM observations that surfaces of the β-FeSi₂ films annealed for 8 h were flatter than that of the as-deposited β-FeSi₂ films.