Abstract
A new fitting function characterizing the target erosion profile in magnetron sputtering is deduced from a simple line source model. For this purpose, Gaussian fit is conventionally used because of its mathematical simplicity. However, the plasma simulation using PIC-MCC method (Particle In Cell Monte Carlo Collision) shows that the Gaussian fit degrades rapidly away from the erosion center and gives an erroneous pressure dependence of the erosion width. The new fit agrees well with measured profiles as well as with the simulation results for various sputtering conditions.
