Abstract
Catalytic chemical vapor deposition (Cat-CVD) is a unique low temperature coating method without using plasma to obtain hydrogenated amorphous silicon (a-Si : H) and silicon nitride (SiNx) films. Using the Cat-CVD, it seems comparatively easy to obtain film thickness uniformity by arranging catalyzer's location in large area. And high efficiency of gas decomposition is also advantageous for large area coating. Large sized CVD equipment is required for some applications, such as solar cell and flat panel display, and the Cat-CVD is considered promising methods for the applications.
We developed a vertical Cat-CVD system with both side depositions for large size substrates of 1.5 m wide. In such both side system, most important point is how to introduce source gases to the catalyzers located in large area for uniform deposition. It is confirmed uniform coating could be achieved at lower pressure and lower setting density of catalyzers.
