Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
Review
Analysis Technique for Exhaust Gas Including PFCs from Microelectronics Manufacturing Processes
Nobuyasu TOMITA, Ryuichiro ISAKI
Author information
JOURNAL FREE ACCESS

2009 Volume 52 Issue 7 Pages 393-396

Details
Abstract
  In the manufacturing processes of Semiconductor and the Liquid Crystal Display (LCD), Perfluorocompounds (PFCs), Sulfurhexafluoride (SF6) and Nitrogenfluoride (NF3), which have high Green house effect,are used in large quantities. As emission reduction of these gases, the following countermeasures are taken.
  1. Opimization of PFCs usage
  2. Utilization of alternative gas
  3. Instllation of Scrubber for exhaust gas treatment
  To inspect the effect of countermeasure that are introduced for these PFCs emission reduction, it is necessary to analyze PFCs in exhaust gas. In this report, we will discribe about analysis technique for exhaust gas including PFCs from microelectornics manufacturing processes.
Content from these authors
© 2009 The Vacuum Society of Japan
Previous article Next article
feedback
Top