Vacuum and Surface Science
“Vacuum and Surface Science is an academic journal published by The Japan Society of Vacuum and Surface Science. The first issue was published in January, 2018. The predecessor journals are “Journal of the Vacuum Society of Japan (JVSJ) and “Hyomen Kagaku (Journal of the Surface Science Society of Japan). The journal is aiming to expand into new fields while following the article types published in the predecessors. The journal starts from Vol. 61, taking over the volume number of the long history of JVSJ.

Predecessors
Hyomen Kagaku (The Journal of Surface Science Society of Japan)
        Vol. 1 (1980) to Vol. 38 (2017)
        Online ISSN : 1881-4743, Print ISSN : 0388-5321
▶ Journal of the Vacuum Society of Japan
        Vol. 51 (2008) to Vol. 60 (2017)
        Online ISSN : 1882-4749, Print ISSN : 1882-2398

Other predecessors (JVSJ is a successor of following journals.)
▶ Shinku (Vacuum)
        Vol. 1 (1958) to Vol. 50 (2007)
        Online ISSN : 1880-9413, Print ISSN : 0559-8516
Shinku Kogyo (Vacuum Industry)
        Vol. 1 (1954) to Vol. 5 (1958)
        Online ISSN : 1883-7174
Shinku Gijutsu (Vacuum Technolgoy)
        Vol. 1 (1950) to Vol. 8 (1957)
        Online ISSN : 1883-7182
Read more
1,023 registered articles
(updated on June 19, 2024)
Online ISSN : 2433-5843
Print ISSN : 2433-5835
JOURNAL PEER REVIEWED PARTIALLY RESTRICTED ACCESS
Featured article
Volume 67 (2024) Issue 6 Pages 261-266
Direct Observation of Single Asperity Friction and Wear Studied by Transmission Electron Microscopy with Atomic Resolution Read more
Volume 67 (2024) Issue 5 Pages 206-211
Electrochemical Imaging of Catalytically Active Site by Scanning Electrochemical Cell Microscopy Read more
Volume 67 (2024) Issue 4 Pages 186-191
Dry Pumps in Accelerator—Usage at the Japan Proton Accelerator Research Complex (J-PARC)— Read more
Volume 67 (2024) Issue 3 Pages 112-116
Frontiers of Near Ambient Pressure X-ray Photoelectron Spectroscopy Read more
Volume 67 (2024) Issue 2 Pages 44-51
Thin-film Silicon Growth by Plasma-enhanced CVD : Gas-phase, Surface and In-film Reactions for High-quality Film Formation Read more
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