“Vacuum and Surface Science” is an academic journal published jointly by The Vacuum Society of Japan and The Surface Science Society of Japan. The first issue was published in January, 2018 on the occasion of the forthcoming merger of the two societies. The predecessor journals are “Journal of the Vacuum Society of Japan (JVSJ)” and “Hyomen Kagaku (Journal of the Surface Science Society of Japan)”. The journal is aiming to expand into new fields while following the article types published in the predecessors. The journal starts from Vol. 61, taking over the volume number of the long history of JVSJ.
Predecessors ▶ Hyomen Kagaku (The Journal of Surface Science Society of Japan) Vol. 1 (1980) to Vol. 38 (2017) Online ISSN : 1881-4743, Print ISSN : 0388-5321 ▶ Journal of the Vacuum Society of Japan Vol. 51 (2008) to Vol. 60 (2017) Online ISSN : 1882-4749, Print ISSN : 1882-2398
Other predecessors (JVSJ is a successor of following journals.) ▶ Shinku (Vacuum) Vol. 1 (1958) to Vol. 50 (2007) Online ISSN : 1880-9413, Print ISSN : 0559-8516 ▶ Shinku Kogyo (Vacuum Industry) Vol. 1 (1954) to Vol. 5 (1958) Online ISSN : 1883-7174 ▶ Shinku Gijutsu (Vacuum Technolgoy) Vol. 1 (1950) to Vol. 8 (1957) Online ISSN : 1883-7182
Semiconductor cleaning is a very important process in integrated circuit manufacturing, and the removal of high dose ion implanted photoresist is a big challenge in semiconductor cleaning owing to their carbonized crust layer generated on and near the surface of the photoresist layer. Microbubbles are a promising candidate in single wafer spin cleaning process for the removal of the crust generated photoresist without any substrate loss. And the bubbles are gas bodies less than 50 micrometer in diameter and shrink underwater due to the rapid dissolution of the interior gas. It has been demonstrated that the bubbles can generate free radicals during the collapsing process under water through the dispersion of the elevated energy accumulated as the surface electricity during the collapsing process of microbubble. In this article the author introduces the fundamental properties of microbubble and their several examples relating to semiconductor cleaning.
This report is a personal research history of the author. The author engaged in the extreme high vacuum project in 1988. Before that time, the research field of the author was limited to the surface finishing of metals. However, since 1988 the author has been stimulated by the intense communication with researchers of different fields, and the author’s research field has been expanded even to the standardization of surface analyses. The author has been involved in the activities of Japan Vacuum Society and Surface Science Society of Japan since 1980’s. Through these activities in societies, the author could get to know many nice researchers, and these researchers help the author to challenge new research fields. Extreme high vacuum is one of the bridges between vacuum and surface. The author believes there are many bridges between vacuum and surface, and communications through these bridges will make the society more active.