Plasma Measurement of Electron Cyclotron Resonance Ion Source for New Materials Production

Abstract

  An electron cyclotron resonance ion source (ECRIS) has been designed and developed for a synthesis of new materials such as endohedral metallofullerenes. The plasma chamber diameter is 140 mm in order to produce large m/q ions, like singly charged C₆₀ ions effectively. In this study, we examined the performance of our ECRIS by plasma measurements using a Langmuir probe. The plasma density increased with increasing Ar pressure and reached to 6.1×10¹⁷ m^-3 at a pressure of 5.0×10^-3 Pa. The plasma was produced over a large volume compared with conventional ECRISs.