Abstract
Active oxygen has strong oxidative ability. Therefore, it can be used for surface treatment processing, e.g., cleaning of Liquid Crystal Display (LCD) glass, ashing for resist materials, and sterilization for medical devices. Nevertheless, effects of active oxygen on the surface have not been fully determined, especially in industrial processing. We have been investigating a new method for monitoring active oxygen with the quartz crystal microbalance (QCM) method for practical industrial uses. We review a principle of active oxygen monitoring using QCM and an instance of active oxygen monitoring for plasma treatment processes.
