Timing of the Lighting of Self-ignited Plasma by N₂ Gas and Ar Gas using Plasma-based Ion Implantation

Abstract

  Plasma-based ion implantation (PBII) is a technique used to modify the surface of samples by immersion in plasma and application of a negative bias voltage to the target. In this study, we showed the PBII was realized using the self-ignition plasma induced by a pulsed bias voltage. Electric discharge properties of the self-ignition plasma were investigated in Ar and N2. The minimum voltage necessary for the plasma generation was expected to be controllable by the pressure and the pulse width.