Effect of Ion Irradiation for Ni Films prepared on a Flexible Substrate Material Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Abstract

  We fabricated Ni films on a flexible substrate material using magnetron sputtering with multipolar magnetic plasma confinement assisted by inductively coupled plasma.
  For each RF Power P_RF value, argon ion emission intensity I_ArII near the HF coil and substrate current Is increased for applying substrate DC bias voltage V_S. We observed that the effect of ion irradiation was enhanced by applying V_S. For V_S=−40 V and P_RF=35 W, the effect of ion irradiation was maximum in deposition conditions. For increasing the effect of ion irradiation, the grain size and surface of fabricated Ni films became large and smooth. In addition, orientation of Ni(111) enhanced. For V_S=−40 V and P_RF=35 W a film resistivity ρ of 8.51×10⁻⁶ Ωcm was observed, which is close to the Ni bulk value of 6.84×10⁻⁶ Ωcm. From these results, we determined that the structure of the fabricated Ni films on the flexible substrate material was affected by the effect of ion irradiation.