Abstract
Fabrication process for Spindt-type field emitter arrays with volcano-structured focus electrode was proposed. The material for the emitter, gate, and focus electrode were optimized from the viewpoint of fabrication process. The emitter material is limited to a few kinds of metal by the process using photoresist. However, using a buffer layer or surface coating method expands the species of emitter material. Our process can control the height of gate and focus aperture; therefore, the optimized structure for specific application will be available.
