Preprints of the National Meeting of JWS
the national meeting 2005 autumn
Session ID : 114
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Rapid synthesis of ZnO film by thermal plasma assisted MOCVD
*Yasutaka AndoShogo TobeHirokazu Tahara
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Abstract
In order to develop a rapid deposition process for oxide ceramic film, ZnO film deposition by thermal plasma assisted MOCVD was carried out. Cnsequently, fully crystallized ZnO could be created without introducing oxygen source in the air.
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© 2005 by Japan Welding Society
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