Abstract
Hard carbon films are deposited with a glow discharge using a mixture of methane and hydrogen. Three kinds of power sources are used : DC, 50Hz sine, and 50Hz rectangular wave. The DC power source is compared with the sine and rectangular waves in regard to the quality and adhesiveness of films. The deposition rate of films is proportional to the discharge current.
Based on the relationships between the deposition rate and the pressure, the contribution from ion flux is estimated in the DC, sine and rectangular wave discharges. The contributions from ion flux to the deposition rates by the sine and rectangular wave discharges are more remarkable than that by the DC discharge. The films deposited by the sine and rectangular discharges give higher adhesiveness.
