Modeling of Hot Wall Type CVD Reactor for Prototype Design

Abstract

CFD simulation of a hot wall type CVD reactor with a shower head gas supply is carried out as numerical experiments for a wide range of reaction conditions and rate constants. The results of these numerical experiments are summarized into equations of dimensionless numbers, and these empirical equations can be applied to quick estimation of growth rate and its dependency on operating conditions.
For the reaction scheme of direct deposition of source gas, growth rate, G.R., is expressed as follows,
whereδ, the thickness of the concentration boundary layer is
In the case of deposition of intermediate species produced in gas phase reaction, G.R., is expressed as follows,
whereδR, the thickness of heating zone above the substrate is
Here, W is the distance between substrate and shower head, Re is Reynolds number based on W, Sc is Schmidt number, Le is Lewis number, T_s is substrate temperature, T₀ is inlet gas temperature, ks is surface reaction rate constant, D and D_s are diffusion coefficient at T₀ and Ts respectively, k_g0 and Ea are pre-exponential factor and activation energy of gas phase reaction respectively, R_g is gas constant and C₀ is inlet source gas concentration.