1976 年 5 巻 6 号 p. 233-237
In many methods to measure MTF of an optical system, a pinhole or a slit is used as a test-target. A test lens is illuminated by the light flux emerging from a test-target. Non-uniformity of the illumination causes some errors on measured MTF values. In order to know this influence, a method has been developed. By this method, axial MTF of an optical system can be calculated simulating the actual MTF measuring process. A lens of high numerical aperature (F/0.75) is used as a test sample. The procedure of MTF calculation and the results are described in detail.