ペリレンイミド単位で連結したポリヘキシルチオフェンとポリスチレンからなるブロック共重合体の合成

抄録

A block copolymer consisting of regioregular poly(3-hexylthiophene) (P3HT) and electrically inert poly(styrene) (PSt) containing perylene diimide (PDI) at the junction (P3HT-PDI-PSt) was designed for photovoltaic applications and synthesized via Suzuki-Miyaura coupling of bromo terminated P3HT and the boronic ester with PSt containing the PDI unit. From grazing incidence wide angle X-ray diffraction analysis for the annealed thin films, it is found that incorporation of PDI hinders the growth of alkyl stacking in the (100) direction of the phase separated P3HT domain. Investigation of space-charge limited current characteristics in the hole-only devices reveals that higher SCLC mobility was observed in the P3HT-PDI-PSt than in the P3HT precursor in spite of the lower crystallinity.