抄録
High-reflection multi-layered mirrors have ever been fabricated using inorganic dielectric materials. Their fabrication methods are almost all based on vacuum evaporation or sputtering. On the other hand, polymeric thin-films such as photo-resists can be easily obtained by spin coating. In this study, we report the results of fabrication of the multi-layered mirrors by spin coating of two different polymers. Optical thickness of layers for λ/4 was controlled by adjusting concentration of solutions and by changing rotation speed of spin coating. Simple repetitive-processes of spin coating and drying solvents yielded reflectivity higher than 99 % at a wavelength of 633 nm after stacking 49 layers. We also report possible applications for novel photonic-devices using polymeric high-reflection multi-layered mirrors or all-polymeric functional devices.
