抄録
Silicon photonic wire waveguide, whose core size is as ultra-small as around 500-nm, is fabricated by using the technologies developed in semiconductor industry. For example, electron-beam or deep-ultraviolet lithography and dry etching using low-pressure plasmas are applied in the fabrication. In the practical application of these technologies, however, we must solve technical difficulties in geometrical error and surface roughness in nanometer level. In this paper, we discuss fabrication technologies that satisfy these severe fabrication accuracies. We also show some practical applications of silicon photonic wire waveguides, and confirm the present standard of their fabrication technologies.
