Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma

Hiroaki NISHIMURA; Shinsuke FUJIOKA; Masashi SHIMOMURA; Hirokazu SAKAGUCHI; Yuki NAKAI; Tatsuya AOTA; Takeshi KAI; Katsunobu NISHIHARA; Noriaki MIYANAGA; Yasukazu IZAWA; Kunioki MIMA; Atsushi SUNAHARA; Yoshinori SHIMADA; Shin-ichi NAMBA

doi:10.2184/lsj.36.1125

High Power / High Energy Lasers and Their Applications

Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma

Hiroaki NISHIMURA, Shinsuke FUJIOKA, Masashi SHIMOMURA, Hirokazu SAKAGUCHI, Yuki NAKAI, Tatsuya AOTA, Takeshi KAI, Katsunobu NISHIHARA, Noriaki MIYANAGA, Yasukazu IZAWA, Kunioki MIMA, Atsushi SUNAHARA, Yoshinori SHIMADA, Shin-ichi NAMBA

著者情報

Hiroaki NISHIMURA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Shinsuke FUJIOKA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Masashi SHIMOMURA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Hirokazu SAKAGUCHI
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Yuki NAKAI
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Tatsuya AOTA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Takeshi KAI
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Katsunobu NISHIHARA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Noriaki MIYANAGA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Yasukazu IZAWA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Kunioki MIMA
Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka, SUita, Osaka 565-0871
Atsushi SUNAHARA
Institute for Laser Technology, 2-6 Yamada-oka, Suita, Osaka 565-0871
Yoshinori SHIMADA
Institute for Laser Technology, 2-6 Yamada-oka, Suita, Osaka 565-0871
Shin-ichi NAMBA
Graduate School of Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-hiroshima, 7398527

キーワード: Laser produced plasma, Extreme Ultraviolet (EUV), Tin opacity

ジャーナルフリー

2008 年 36 巻 APLS 号 p. 1125-1128

DOI https://doi.org/10.2184/lsj.36.1125

詳細

抄録

Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databases are provided for a wide range of parameters of lasers and targets. These data are utilized directly as a technical guide-line for EUV source system design in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.

責任著者(Corresponding author)

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