The Review of Laser Engineering
Online ISSN : 1349-6603
Print ISSN : 0387-0200
ISSN-L : 0387-0200
Laser Original
Design of Diffractive Beam Splitters for Dual-Wavelength and Concurrent Irradiation of Process Points
Jun AMAKO
Author information
JOURNAL FREE ACCESS

2013 Volume 41 Issue 1 Pages 54-

Details
Abstract
We report the design of diffractive beam splitters for dual-wavelength laser processing. They produce beam arrays for two different wavelengths in the way the arrays coincide at target points on a workpiece to process. The digitized surface profiles of the dual-wavelength splitters were designed using an iterative algorithm by considering the splitting performances, the material dispersion, and the wavelengths. For the chosen wavelengths of 1064 and 266 nm, as an example, we needed 32 phase levels and 42 pixels to obtain splitting effi ciencies of > 80% and splitting uniformities of > 0.90. The minimum pixel width was ~1% of the splitter period. The tolerances of the profi le errors were found to be ~1% of the designed depths. The shorter the wavelength is, the more sensitive the splitter performances are to the errors. Using achromatic splitters we can exploit the advantages of dualwavelength laser processing and attain a high throughput.
Content from these authors
© 2013 by The Laser Society of Japan
Previous article Next article
feedback
Top