抄録
Transverse-fl ow CO2 laser amplifi ers were constructed to generate a high-power pulsed CO2 laser for an
extreme ultraviolet light source of nano-lithography. We evaluated the amplifi ers using a short-pulse
seed laser. The pulse tandem amplifi ers emitted an average output power of 8.3 kW with an electrical
power 200 kW discharge. The input short-pulse laser had an average power of 20 W, the repetition rate
was 100 kHz, and the pulse duration was 15 ns. Our experiment showed that the electrical-to-optical
effi ciency was higher than that of the axial-fl ow amplifi ers at the same laser input power.
