レーザー研究
Online ISSN : 1349-6603
Print ISSN : 0387-0200
ISSN-L : 0387-0200
レーザー解説
CMOSプロセスを用いたシリコンフォトニクス
馬場 俊彦
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ジャーナル フリー

2020 年 42 巻 3 号 p. 223-

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抄録
Si photonics technologies enable dense integration of such photonic devices as passive devices, p/n modulators, and Ge photo-diodes. The CMOS-compatible foundry services of Si photonics achieve wafer-scale production of photonic integrated circuits with sophisticated functions as well as low cost by a multi-project-wafer process. Recently, they also include the fabrication of complicated photonic crystals and related nanostructures in their recipes. Thus, the research and development of photonic devices and integrated circuits are changing rapidly and becoming more design- and system-oriented. This paper reports such new trends and some example demonstrations.
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