Abstract
Photoassisted chemical vapor deposition of metal films, and photoassisted epitaxy of semiconductor films are described with an emphasis on several important problems. Successful applications of laser induced metal deposition for reparing photolithographic masks' pinhole defects and for circuit restructuring of semiconductor devices are demonstrated. With explaining these examples, however, intrinsic problems are pointed out regarding micropattern formation by projection printing deposition using large cross-sectional laser light. A new approach that would enable the photolithographyless film patterning in large area is shown. Next, several studies on photoassisted epitaxy of semiconductors are briefly reviewed from the view point of epitaxy temperature lowering. After extracting the expected photoinduced effects, an experiment of photoassisted Zn S film deposition is described to clarify the surface adatom rearrangement effect which is essentially important for lower-ing the epitaxial growth temperature.
