レーザー分光法によるプラズマCVD診断
1987 年 15 巻 4 号 p. 215-222
詳細
1987 年 15 巻 4 号 p. 215-222
Plasma-assisted chemical vapor deposition (CVD) is used to deposit solid films for microelectronic applications. Laser spectroscopic methods should facilitate improved understanding of physical and chemical processes ocurring in CVD which, in turn, should lead to the process control and the novel deposition methods. In this paper, laser diagnostic techniques appropriate to spatially-resolved concentration measurements of the species which are the key to CVD process will be reviewed. The review will mainly encompass the Raman spectroscopy and the laser-induced fluorescence spectroscopy. The specific examples of the investigation of CVD process using these techniques are also described.
