抄録
An Ar (126nm) or a Kr (146nm) excimer laser, once used as a cavity reflector, has been found to cause serious surface damage-to silica glass. The damage was observed with an optical profilemeter and a selected-area X-ray photoelectron spectrometer. Transmission and reflectance spectra were also taken at the UVSOR facility. Si isolation in the surface layer is caused by Ar excimer laser irradiation, but not by Kr excimer laser irradiation. Excitons generated by Ar excimer laser photons via an efficient one photon process are considered to play a fundamental role inthe Si isolation.
