抄録
Relative sensitivity factors (RSFs) in secondary ion mass spectrometry are evaluated from the viewpoint of long term stability using RSFs in semiconductor materials obtained through routine analysis over five years. The variation of RSFs is within ±50% for many kinds of ions in GaAs, InP, and Si. The difference in the RSFs measured by two magnetic sector type instruments with identical mass spectrometers is within the RSF variation for each instrument. These results support the idea that the RSF is transferrable between SIMS instruments of the same type, and quantitative analysis with a deviation of ±50% can be performed using a database of instrument-dependent RSFs.
