Journal of the Mass Spectrometry Society of Japan
Online ISSN : 1880-4225
Print ISSN : 1340-8097
ISSN-L : 1340-8097
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Fabrication of Complex Nano Structure by Metal/Semiconductor Cluster Flux
Sakae TANEMURAJunichi MURAKAMIYutaka TAIMasahiro GOTOKazuo IGARASHI
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1997 Volume 45 Issue 2 Pages 137-157

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Abstract
Recently we have sucessfully developed, 1) the apparatus to select a size of clusters, which is generated by laser ablation and innert gas aggregation techniques, by a TOF mass spectrometer with an ion reflector and a mass gate, 2) the machine to generate mass selected cluster flux with high density by CORDIS (Cold Reflex Discharge Ion Source), gas filled multi cooling stages consisted of Q-pole, and mass selection filters by means of Q-mass spectrometer, and 3) the apparatus to generate highly densed ionized cluster flux by Ar discharged magnetron sputtering gun operated under about 1,000 Pa He as an aggregation gas, to study deposition of cluster flux with and/or without a kinetic energy onto substrate for a fabrication of a complex quantum confined nano structure on any substrate by using clusters as building blocks.
In this paper, the main characteristics of above three apparatuses and some of the recent preliminary experimental results are summarized. And the prospects of this new attempt are discussed after reviewing the latest progresses of computer simulation on “soft landing” and “hard collision” by cluster impacts onto a crystal substrate by our colaborative laboratory.
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© 1997 by The Mass Spectrometry Society of Japan
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