Materia Japan
Online ISSN : 1884-5843
Print ISSN : 1340-2625
ISSN-L : 1340-2625
Metal/semiconducter interfaces studied by high-energy ion scattering · channeling technique
Toshimichi Ito, Akio Hiraki
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Keywords: high-energy ion scattering, ion channeling, transmission channeling, metal/semiconductor interface, metal/silicon, interfacial reaction
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1995 Volume 34 Issue 7 Pages 831-836

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