2005 年 46 巻 6 号 p. 1331-1334
Epitaxial Pd–Al alloy films were grown on α-Al2O3(0001) substrates by sputter-deposition. The composition of the films was approximately Pd0.8Al0.2. The films were completely oriented with (111) plane parallel to the surface without any trace of other intermetallic compounds. The oxidation behavior of the films in ultra-high vacuum at elevated temperature was studied. It was revealed that only aluminum was oxidized and the growth of alumina film stopped quickly at 0.5 nm in thickness. There were some indications that the alumina film was crystalline.
