2008 年 49 巻 12 号 p. 2907-2911
Sputter deposited Cr-Mo alloy films have been investigated in electrical properties and microstructures. The resistivity of the films decreased with the Mo concentration from 20 to 40 at% and increased up to 80 at%Mo and showed lowest value at Mo film. This resistivity change was discussed with microstructure observations, XRD and recoiled Ar concentration. SEM and TEM images indicated that several grains were combined and form lager aggregated grains and columnar structure. Stress in the films was discussed also with relationship of Mo concentration.
