Ti and Ni Cluster Composites Prepared by A Dual Source Plasma Gas Condensation Cluster Deposition System

抄録

Ti and Ni clusters have been formed, and codeposited on substrates using a new plasma-gas-condensation cluster deposition system, in which two DC glow-discharge-sources are installed in completely separated two sputtering chambers. Transmission electron microscope (TEM) observations of these codeposited specimens indicate that Ti and Ni clusters are randomly mixed with each other. Hcp Ti and fcc Ni diffraction rings are detected in selected area electron diffraction patterns, and no clear alloying can be detected at around the interface between Ti and Ni clusters in the high resolution TEM image. These results demonstrate that Ti and Ni cluster nanocomposites are obtained from this method.