Effect of Ar/Ar-H₂ Plasma Arc Melting on Cu Purification

抄録

Removal of impurities from Cu metal by Ar and Ar-20%H₂ plasma arc melting (PAM) has been carried out. Several impurities such as Li, Na, Mg, P, S, Cl, K, Ca, Zn, Pd, Pb and Bi in Cu were efficiently removed when only Ar plasma gas was used. Moreover, removal degrees for the above mentioned impurities were significantly increased after Ar-20%H₂-PAM, especially for K, Zn and Pd. It was found that Ar-H₂ PAM showed an excellent effect to eliminate impurities with higher vapor pressures than that of Cu metal.