Materials Transactions, JIM
Online ISSN : 2432-471X
Print ISSN : 0916-1821
ISSN-L : 0916-1821
Diffusion Coefficient of Hydrogen in Palladium Films Prepared by RF Sputtering
Hideki Hagi
著者情報
ジャーナル フリー

1990 年 31 巻 11 号 p. 954-958

詳細
抄録

Diffusion coefficients of hydrogen in the palladium films of α-phase have been measured between 278 and 323 K by an electrochemical stripping method. Palladium films were deposited on iron by RF sputtering. The values of the diffusion coefficient of hydrogen obtained for the film specimens 0.68 μm and 1.36 μm in thickness were about 2 orders of magnitude lower than those reported for the bulk specimens in the literature, and the temperature dependence of the diffusion coefficients of hydrogen was given by DH(m2⁄s)=4.16×10−9exp(−25.7(kJ/mol)⁄RT).

著者関連情報
© The Japan Institute of Metals
前の記事 次の記事
feedback
Top