Magnetic Properties and Structures of Co–C Thin Films Prepared by Sputtering

Abstract

Co–C thin films are prepared by the DC magnetron sputtering method and are followed by annealing in a vacuum. The relation between the magnetic properties and structural changes of the films have been investigated. The as-sputtered films showed the soft magnetic property with coercivity of 70 A/m at 3.7 at%C, and after annealing the films showed the hard magnetic property with coercivity of 45 kA/m at 5.9 at%C. It is found that this drastic change in the magnetic properties is closely related with a change of the structure and/or morphology of the films.