Application of Imaging Plates to High-Resolution High-Voltage Electron Microscopy

Abstract

HRTEM images of an irradiation-sensitive YBCO crystal were taken by using an IP with a pixel size of 25 μm, in an HVEM operated with an accelerating voltage of 800 kV, under different operating conditions. It is found that, as far as the expected resolution is 0.20 nm, the optimum operating condition of the IPs is what is expected from the viewpoint of DQE and S/N ratio; HRTEM images can be taken with the intensity which is lower by two orders than that necessary for a conventional film, without any irradiation damage. The decay rate of information after the exposure to the electron beam has also been measured and it is found that very immediate processing of the IP right after the exposure should be avoided for measuring HRTEM image intensity quantitatively.