Abstract
Chemical vapor deposition is a method to prepare solid products in the form of a film or a particle directly from reactive vapors. Industrially, CVD is an important process for thin film preparation in IC (integrated circuit) technology and surface coating for miscelaneous purposes. The mechanism to form films and/or particles by CVD is very complex and not well known yet. Attempts to apply the CVD process to the preparation of membranes to be used for saparation are scarce. Recently proposed particle-precipitation aided CVD (PPCVD) can produce porous films and a concept for partial densification of porous films to form very thin film within the porous film has also been proposed. The preparation of inorganic thin films for separation has just started.
