Reworkable Dimethacrylates with Low Shrinkage and Their Application to UV Nanoimprint Lithography ─Effect of Monomer Structure─

Abstract

Four types of reworkable dimethacrylates bearing hemiacetal ester groups were applied to UV nanoimprint lithography (UV-NIL) and fi ne line/space patterns were obtained. The shrinkage in height of the UV imprinted pattern was discussed in terms of the kinetic chain length of UV cured networks, hardness, and photoreactivity of the monomers. A reworkable monomer having adamantyl unit was the most promising candidate for application of UV-NIL.