Development of Novel Phenolic Cyclic Oligomer for Electric and Electronic Material

Abstract

In the development of photoresists for each wavelength, such as g/i-line, KrF and ArF, it was necessary to select suitable polymer platform in order to obtain enough transmittance of the wavelength being used. This paper reported syntheses of novel phenolic cyclic oligomers (naphthalene type calixarenes) and those physical properties. Very interesting behavior was observed caused to have cyclic structure. Pattern size reduetion of semiconductor products has been attributable to the development of lithographic technology.