Section A
Structural Analyses and Photoelectrochemical Properties of Niobium Oxides Amorphous Film with O/Nb = 2.5, 2.6, and 2.7
Go Sajiki, Takashi Inoue, Hiroshi Okano, Tomoyuki Koganezawa, Koji Ohara, Hironori Ofuchi
Author information
Keywords:
Photoelectrochemistry,
Structural analysis, Amorphous film,
Niobium oxide,
Synchrotron radiation,
High-energy X-ray diffraction,
X-ray absorption fine structure,
Reverse Monte Carlo simulation,
Bond valence sum,
2017B1894,
2018A1049,
2018A1543,
BL19B2,
BL04B2,
BL14B2
2020 Volume 8 Issue 2 Pages 324-328
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