Journal of Network Polymer,Japan
Online ISSN : 2186-537X
Print ISSN : 1342-0577
ISSN-L : 1342-0577
Phenolic Resin for Photoresist
Yasushi ARITA
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2000 Volume 21 Issue 3 Pages 126-135

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Abstract
Lithography is an important technique for the electronic industries. In the manufacture of a semiconductor and a liquid crystal display (LCD), photoresist is used as a key photo sensitive material. An example is a phenolic as a base resin that controls photoresist characters and plays an active part in the electronic industries. This review describes the results of investigation on the published reports and patents which are concerned with the phenolic photoresists. Kettle materials for a reaction vessel are also introduced for obtaining a specific phenolic resin which is controlled to an extremely low metal content of a ppb level, and manufacturing methods for obtaining a phenolic resin with low-dispersed molecular weight.
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© Japan Thermosetting Plastics Industry Association
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