NIPPON KAGAKU KAISHI
Online ISSN : 2185-0925
Print ISSN : 0369-4577
Composition of Amorphous Tin Oxide Films and Their Thermal Behavior
Shigetoshi MURANAKAYoshichika BANDOToshio TAKADA
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1987 Volume 1987 Issue 11 Pages 1886-1890

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Abstract

Five kinds of amorphous tin oxide films were prepared by reactive evaporation under various conditions. The composition and thermal behavior of the films were studied, by TG, DSC, X-ray diffraction and 119Sn Mssbauer measurements. Depending on the deposition condition, the films had some composition in the range of SnO1.3-SnO1.5. The microstructure of the films was porous, this porosity decreased at higher deposition temperatures. When films were heated in air, they were perfectly oxidized at about 200°C, and then crystallized to ruffle-type SnO2 at about 370°C. In the N2 gas, films were crystallized to two phases of α-SnO and rutile-type SnO2 at about 400°C.

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